原子层沉积生长速率的控制研究进展
卢维尔1, 董亚斌1,2, 李超波1, 夏洋1, 李楠1

Research Progress on Growth Rate Controlling of Atomic Layer Deposition
LU Wei-Er1, DONG Ya-Bin1,2, LI Chao-Bo1, XIA Yang1, LI Nan1
图5 引起表面化学吸附饱和的因素
Fig. 5 Factors identified to cause saturation of irreversible chemisorptions a number of reactive surface sites [ 23 , 24 , 25 ] and b steric hindrance of the ligands #cod#x0201c;steric hindrance#cod#x0201d; [ 16 , 26 , 27 , 28 ]