原子层沉积生长速率的控制研究进展
卢维尔1, 董亚斌1,2, 李超波1, 夏洋1, 李楠1

Research Progress on Growth Rate Controlling of Atomic Layer Deposition
LU Wei-Er1, DONG Ya-Bin1,2, LI Chao-Bo1, XIA Yang1, LI Nan1
图3 铝原子Al和甲基Me的沉积数目随衬底表面羟基OH活性基团浓度的变化 [ 15 , 16 , 17 ]
Fig. 3 Illustration of the physical situation corresponding to number of aluminum atoms #cod#x025B3; C Al and methyl groups #cod#x025B3; C Me adsorbed in the self-terminating AlMe 3 reaction on surfaces with different OH group concentrations C OH [ 15 , 16 , 17 ] Resulting in average MeAl ratios of a 3, b 2 and c 1.5. The squares represent an area of 3 nm 2 ; the methyl groups are drawn in scale Me=0.2 nm -2