原子层沉积生长速率的控制研究进展
卢维尔1, 董亚斌1,2, 李超波1, 夏洋1, 李楠1

Research Progress on Growth Rate Controlling of Atomic Layer Deposition
LU Wei-Er1, DONG Ya-Bin1,2, LI Chao-Bo1, XIA Yang1, LI Nan1
图10 空间ALD反应器示意图 [ 38 ] 图中以ZnO的制备为例介绍反应原理a DEZ和H 2 O的半反应区间通过气体轴承区分。通过移动衬底下方的反应器, 两个半反应能交替的进行, 形成单层ZnO薄膜。b空间ALD反应器底面顶部示意图: DEZ和H 2 O的半反应区被集成到排气区和气体轴承面所包围的入口处, 颜色对应于a中的标注。c反应器的示意图: 反应器顶部和放置衬底的旋转台放置在腔体中。旋转台由伺服电机旋转驱动, 管路通过腔体上方的开口连接到反应器顶部
Fig. 10 a Schematic drawing of the spatial ALD reactor [ 38 ] , where the DEZ and water half-reaction zones are separated by gas bearings. By moving the substrate underneath the reactor, the two half-reactions will take place subsequently to form a ZnO monolayer. b Schematic drawing of the bottom side of the spatial ALD reactor head, where the DEZ and water half-reaction zones are integrated into inlets surrounded by exhausts zones and gas bearing planes. c Schematic drawing of the reactor. The reactor head and rotating substrate table with the substrate in between are placed in an oven. The substrate table is rotated by a servo-motor, connected by a drive shaft. The process and waste gas lines are connected to the reactor head through an opening in the top