氧化锌脱膜和激光刻蚀制备亚微米自支撑聚酰亚胺薄膜及其性能

刘仁臣, 吴永刚, 夏子奂

Preparation and Properties of Submicron Free-standing Polyimide Thin Film Using ZnO Demoulding and Laser Ablation

LIU Ren-Chen, WU Yong-Gang, XIA Zi-Huan

图6 厚度为950 nm自支撑PI薄膜a和采用45 mJcm 2 能量密度刻蚀100个脉冲得到的厚度为150 nm自支撑PI薄膜b
Fig. 6 Pictures of the 950 nm PI film a and the 150 nm free-standing PI film obtained with 100 pulses at 45 mJcm2 b