氧化锌脱膜和激光刻蚀制备亚微米自支撑聚酰亚胺薄膜及其性能

刘仁臣, 吴永刚, 夏子奂

Preparation and Properties of Submicron Free-standing Polyimide Thin Film Using ZnO Demoulding and Laser Ablation

LIU Ren-Chen, WU Yong-Gang, XIA Zi-Huan

图4 采用60 mJcm 2 能量密度刻30个脉冲后PI薄膜的台阶扫描曲线a和刻蚀速率随能量密度变化的关系曲线b
Fig. 4 Step curve of PI film ablated with 30 pulses at 60 mJcm2 a and the average etch rate vs laser fluence based on experiment data and theory calculations b