低成本电化学法制备RE2Zr2O7缓冲层
蔡增辉, 刘志勇, 鲁玉明, 蔡传兵

Fabricating RE2Zr2O7 Buffer Layers by Low Cost Electrodeposition
CAI Zeng-Hui, LIU Zhi-Yong, LU Yu-Ming, CAI Chuan-Bing
图3 La 3+ 与Zr 4+ 摩尔配比为6:4的溶液在0.5 mAcm 2 的电流密度下制得的不同厚度的LZO薄膜的XRD图谱
Fig. 3 XRD patterns of LZO samples with different thickness prepared at the current density of 0.5 mAcm 2 in solutions with 6:4 mole ratios of La 3+ to Zr 4+ a 45 nm; b 60 nm; c 75 nm; d 90 nm; e 105 nm; f 120 nm