AgInSbTe相变薄膜的热刻蚀腐蚀特性

李豪^1,², 耿永友¹, 吴谊群^1,³

Thermal Etching Characteristics of AgInSbTe Phase Change Film

LI Hao^1,², GENG Yong-You¹, WU Yi-Qun^1,³

图1 AgInSbTe薄膜200 nm的XRD图谱
Fig. 1 XRD patterns of the AgInSbTe films 200 nm a As-deposited, After annealed at b 200℃, c 250℃ and d 300℃