氮流量对贫铀表面磁控溅射CrN<italic><sub>x</sub></italic>薄膜结构与性能的影响

氮流量对贫铀表面磁控溅射CrN_x薄膜结构与性能的影响

朱生发¹, 吴艳萍², 刘天伟¹, 杨锁龙¹, 唐凯², 魏强²

Effect of N₂ Flow on Microstructure and Properties of CrN_x Film Prepared by Unbalanced Magnetron Sputtering on the Surface of Depleted Uranium

ZHU Sheng-Fa¹, WU Yan-Ping², LIU Tian-Wei¹, YANG Suo-Long¹, TANG Kai², WEI Qiang²

图5 氮流量为30 sccm时CrN薄膜表面成分
Fig. 5 Surface compositions of CrN film deposited at N 2 flow of 30 sccm a Atomic ratio of Cr, N and O; b Relative intensity ratio of Cr element