氮流量对贫铀表面磁控溅射CrNx薄膜结构与性能的影响
朱生发1, 吴艳萍2, 刘天伟1, 杨锁龙1, 唐凯2, 魏强2

Effect of N2 Flow on Microstructure and Properties of CrNx Film Prepared by Unbalanced Magnetron Sputtering on the Surface of Depleted Uranium
ZHU Sheng-Fa1, WU Yan-Ping2, LIU Tian-Wei1, YANG Suo-Long1, TANG Kai2, WEI Qiang2
图4 氮流量为30 sccm时CrN x 膜的Cr2p 32 a和N1sb的高斯拟合结果
Fig. 4 Gauss fitting results of Cr2p 32 a and N1s b deposited at N 2 flow of 30 sccm