氮流量对贫铀表面磁控溅射CrN<italic><sub>x</sub></italic>薄膜结构与性能的影响

氮流量对贫铀表面磁控溅射CrN_x薄膜结构与性能的影响

朱生发¹, 吴艳萍², 刘天伟¹, 杨锁龙¹, 唐凯², 魏强²

Effect of N₂ Flow on Microstructure and Properties of CrN_x Film Prepared by Unbalanced Magnetron Sputtering on the Surface of Depleted Uranium

ZHU Sheng-Fa¹, WU Yan-Ping², LIU Tian-Wei¹, YANG Suo-Long¹, TANG Kai², WEI Qiang²

图2 不同氮流量CrN x 薄膜的断面形貌 a 10 sccm; b 30 sccm; c 50 sccm
Fig. 2 Cross-section morphology of CrN x film deposited at various N 2 flow