氮流量对贫铀表面磁控溅射CrNx薄膜结构与性能的影响
朱生发1, 吴艳萍2, 刘天伟1, 杨锁龙1, 唐凯2, 魏强2

Effect of N2 Flow on Microstructure and Properties of CrNx Film Prepared by Unbalanced Magnetron Sputtering on the Surface of Depleted Uranium
ZHU Sheng-Fa1, WU Yan-Ping2, LIU Tian-Wei1, YANG Suo-Long1, TANG Kai2, WEI Qiang2
图1 不同氮流量下CrN x 薄膜的XRD图谱
Fig. 1 XRD patterns of CrN x film deposited at different N 2 pressures