Journal of Inorganic Materials ›› 2020, Vol. 35 ›› Issue (7): 839-846.DOI: 10.15541/jim20190380

Special Issue: 环境材料论文精选(2020)

• RESEARCH LETTERS • Previous Articles    

Fabrication of Z-scheme BiVO4/GO/g-C3N4 Photocatalyst with Efficient Visble-light Photocatalytic Performance

XU Shichao1,ZHU Tianzhe1,QIAO Yang2,BAI Xuejian2,TANG Nan1,ZHENG Chunming2   

  1. 1. School of Environmental Science and Engineering, Tiangong University, Tianjin 300389, China
    2. School of Chemistry and Chemical Engineering, Tiangong University, Tianjin 300389, China
  • Received:2019-07-23 Revised:2019-11-05 Published:2020-07-20 Online:2019-12-04
  • Supported by:
    National Natural Science Foundation of China(51772208);National Natural Science Foundation of China(51678409);Natural Science Foundation of Tianjin(17JCYBJC15900)

Abstract:

Fabricating Z-scheme photocatalysts is a promising method for improving photocatalytic activity by effectively enhancing charge separation. A new Z-scheme BiVO4/GO/g-C3N4 photocatalyst was prepared by two steps of impregnation-calcination and hydrothermal method, and then characterized by different methods. In the photocatalytic process of BiVO4/GO/g-C3N4, GO nanosheet act as fast transmission channels between BiVO4 and g-C3N4 and can suppress electron-hole recombination, which significantly promotes the charge separation and improves the redox ability of the ternary heterojunction. The ternary photocatalyst has good photocatalytic degradation of Rhodamine B (RhB) as compared to the single-component or binary composite. It is capable of degrading 85% of RhB in 120 min under visible light irradiation and the hole (h+) plays a major role in the reaction. This work provides a simple preparation method for a ternary photocatalyst system in which g-C3N4 coupled with BiVO4 by GO to significantly improve photocatalytic activity.

Key words: BiVO4, g-C3N4, GO, ternary photocatalyst, Z-scheme heterojunction

CLC Number: