Nano-structured WO3 Thin Films Deposited by Glancing Angle Magnetron Sputtering

doi:10.15541/jim20180130

Abstract

Abstract:

Nano-structured tungsten oxide (WO₃) thin films were deposited at room temperature by glancing angle reactive magnetron sputtering and then annealed at 450℃ in air. The films were characterized by field-emission scanning electron microscope (FE-SEM) and X-ray diffraction (XRD). The WO₃ thin film deposited by DC magnetron sputtering at 80° glancing angle exhibited oblique nano-column structure, while deposited by pulsed DC magnetron sputtering at the same angle exhibits nano-pore structure. After annealing at 450℃ for 3 h, the oblique nanocolums are conjunct with each other but the nano-pore structured remains with bigger pore size. XRD analysis reveals that WO₃thin films deposited at room temperature demonstrate amorphous structure. The amorphous structure will transfers to monoclinic phase after annealing at 450℃ for 1 h. Transmittance difference between colorization and bleaching of nano-structured WO₃ thin film reaches 60% at wavelength of 600 nm. Electrochromic properties of nano-structured WO₃thin films are highly reversible.

Key words: WO₃ thin films, nano-structured, glancing angle, magnetron sputtering

CLC Number:

TB34

WANG Mei-Han, WEN Jia-Xing, CHEN Yun, LEI Hao. Nano-structured WO₃ Thin Films Deposited by Glancing Angle Magnetron Sputtering[J]. Journal of Inorganic Materials, 2018, 33(12): 1303-1308.

Figures/Tables 8

Fig. 1 Schematic diagram of glancing angle magnetron sputtering of WO3 thin films[22]

Fig. 2 Surface and cross-section images of WO3 thin films deposited by DC magnetron sputtering at 0 and 80° glancing angles Surface (a) and cross-section(b) images, deposited at 0 glancing angle; Surface (c) and cross-section (d) images, deposited at 80° glancing angle

Fig. 3 XRD patterns of WO3 film deposited by DC magnetron sputtering at 80° glancing angle(a) As-deposited; (b) After annealing at 450℃ for 1 h; (c) After annealing at 450℃ for 3 h

Fig. 4 Surface (a) and cross-section (b) images of WO3 films deposited by DC magnetron sputtering at 80° glancing angles after annealing at 450℃ for 3 h

Fig. 5 Surface morphologies of WO3 films deposited by pulsed DC magnetron sputtering at different glancing angles

Fig. 6 Surface and cross-section images of WO3 films deposited by pulsed DC magnetron sputtering at 80o glancing angles(a,b) as-deposited; (c,d) after annealing at 450℃ for 1 h; (e,f) after annealing at 450℃ for 3 h

Fig. 7 Transmittance spectra of colorization/bleaching states of WO3 film deposited by DC magnetron sputtering at 0 and 80° glancing angles

Fig. 8 Transmittance spectra of colorization/bleaching states of WO3 film deposited by pulsed DC magnetron sputtering at 80° glancing angle

References 28

[1]	DEB S K.Opportunities and challenges in science and technology of WO3 for electrochromic and related applications.Solar Energy Materials and Solar Cells, 2008, 92: 245-258.
[2]	PENG MING-DONG, ZHANG YUZHI, SONG LI-XIN,et al. Structured and electrochromic properties of titanium-doped WO3 thin film by sputtering. Journal of Inorganic Materials, 2017, 32(3): 287-292.
[3]	ZHOU J C, LIN S W, CHEN Y J,et al. Facile morphology control of WO3 nanostructure arrays with enhanced photoelectrochemical performance. Appl. Surf. Sci., 2017, 403: 274-281.
[4]	BUCH V R, CHAWLA A K, RAWAL S K.Review on electrochromic property for WO3 thin films using different deposition techniques.Materials Today, 2016, 3(6): 1429-1437.
[5]	MAN W K, LU H, JU L C,et al. Effect of substrate pre-treatment on microstructure and enhanced electrochromic properties of WO3 nanorod arrays. RSC Adv., 2015, 5: 106182-106190.
[6]	CAI G F, TU J P, ZHOU D,et al. Growth of vertically aligned hierarchical WO3 nano-architecture arrays on transparent conducting substrates with outstanding electrochromic performance. Sol. Energy Mater. Sol. Cells, 2014, 124: 103-110.
[7]	KONDALKAR V V, KHARADE R R, MALI S S,et al. Nanobrick- like WO3 thin films: hydrothermal synthesis and electrochromic application. Superlattices Microstruct., 2014, 73: 290-295.
[8]	PATIL J M, PATIL S B, BARI R H,et al. Influence of film thickness on structural, surface morphology and electrical properties of spray pyrolise nanostructured WO3 thin films. Journal of Advanced Physics, 2016, 5(4): 359-363.
[9]	HILLIARD S, BALDINOZZI G, FRIEDRICH D,et al. Mesoporous thin film WO3 photoanode for photoelectrochemical water spitting: a Sol-Gel dip coating approach. Sustainable Energy Fuels, 2017, 1: 145-153.
[10]	LU SHU-JUAN, WANG CHANG, ZHAO BO-WEN,et al. Electrochromic properties of PEG-modified tungsten oxide thin films. Journal of Inorganic Materials, 2017, 32(2): 185-190.
[11]	CHAI Y N, KHAIRUNISAK A R, ZAINOVIAL L.WO3 nanoporous-nanorod film formed by hydrothermal growth of nanorods on anodized nanoporous substrate.J. Electrochem. Soc., 2015, 162: E148-E153.
[12]	WHITE C M, GILLAPIE D T, WHITNEY E,et al. Flexible electrochromic devices based on crystalline WO3 nanostructures produced with hot-wire chemical vapor deposition. Thin Solid Films, 2009, 517(12): 3596-3599.
[13]	LI Y B, BANDO Y, GOLBERG D,et al. WO3 nanorods/nanobelts synthesized via physical vapor deposition process. Chemical Physics Letters, 2003, 367(1/2): 214-218.
[14]	CASTRO-HURTADO I, TAVERA T, YURRITA P,et al. Structural and optical properties of WO3 sputtered thin films nanostructured by laser interference lithography. Applied Surface Science, 2013, 276: 229-235.
[15]	DEEPA M, SRIVASTAVA A K, SOOD K N,et al. Nanostructured mesoporous tungsten oxide films with fast kinetics for electrochromic smart windows. Nanotechnology, 2006, 17: 2625-2630.
[16]	ROBBOE K, SIT J C, BRETT M J.Advanced techniques for glancing angle deposition (GLAD).Journal of Vacuum Science and Technology B, 1998, 16(3): 1115-1122.
[17]	ZHAO Y P, YE D X, WANG G C,et al. Designing nanostructures by glancing angle deposition. Proceeding of SPIE, 2003, 5219: 59-73.
[18]	CHARLES C, MARTIN N, DEVEL M.Optical properties of nanostructured WO3 thin films by glancing angle deposition: comparison between experiment and simulation.Surface & Coatings Technology, 2015, 276(2): 136-140.
[19]	CHARLES C, MARTIN N, DEVEL M,et al. Correlation between structural and optical properties of WO3 thin films sputter deposited by glancing angle deposition. Thin Solid Films, 2013, 534: 275-281.
[20]	HORPRATHUM M, LIMWICHEAN K, WISITSORAAT A,et al. NO2-sensing properties of WO3 nanorods prepared by glancing angle DC magnetron sputtering. Sensor and Actuator B, 2013, 176: 685-691.
[21]	王美涵. 制备结构可控功能薄膜的装置. 中国, 专利号ZL201620235960.0. 2016.08.17.
[22]	WISITSORAAT A, AHMAD M Z, YAACOB M H,et al. Optical H2 sensing properties of vertically aligned Pd/WO3 nanorods thin films deposited via glancing angle rf magnetron sputtering. Sensors and Actuators B: Chemical, 2013, 182: 795-801.
[23]	TAIT R N, SMY T, BRETT M J.Structural anisotropy in oblique incidence thin metal films. J. Vac. Sci. Technol. A, 1992, 10: 1518-1521.
[24]	ROBBIE K, BRETT M J.Sculptured thin films and glancing angle deposition: growth mechanics and applications. J. Vac. Sci. Technol. A, 1997, 15: 1460-1465.
[25]	NIEUWENHUIZEN J M, HAANSTRA H B.Microfractography of thin films.Philips Technol. Rev., 1966, 27(3/4): 87-89.
[26]	BESNARD A, MARTIN N, CARPENTIER L,et al. A theoretical model for the electrical properties of chromium thin films sputter deposited at oblique incidence. J. Phys. D: Appl. Phys., 2011, 44: 215301.
[27]	TAIT R N, SMY T, BRETT M J.Modelling and characterization of columnar growth in evaporated films.Thin Solid Films, 1993, 226(2): 196-201.
[28]	ROBBIE K, BRETT M J.Sculptured thin ﬁlms and glancing angle deposition: growth mechanics and applications.Journal of Vacuum Science and Technology A, 1997, 15(3): 1460-1465.

Nano-structured WO₃ Thin Films Deposited by Glancing Angle Magnetron Sputtering

RichHTML

PDF (PC)

Knowledge

Cited

Abstract

Cite this article

share this article

Figures/Tables 8

References 28

Related Articles 15

Recommended Articles

Metrics

Comments

[1]	WANG Ying, ZHANG Wenlong, XING Yanfeng, CAO suqun, DAI Xinyi, LI Jingze. Performance of Amorphous Lithium Phosphate Coated Lithium Titanate Electrodes in Extended Working Range of 0.01-3.00 V [J]. Journal of Inorganic Materials, 2021, 36(9): 999-1005.
[2]	ZHAO Changjiang,MA Chao,LIU Juncheng,LIU Zhigang,CHEN Yan. Sputtering Power on the Microstructure and Properties of MgF₂ Thin Films Prepared with Magnetron Sputtering [J]. Journal of Inorganic Materials, 2020, 35(9): 1064-1070.
[3]	CHENG Dan, HUANG Bin, CHEN Tao, JING Feng-Juan, XIE Dong, LENG Yong-Xiang, HUANG Nan. Microstructure of TiCuO Films on Copper Ion Release and Endothelial Cell Behavior [J]. Journal of Inorganic Materials, 2018, 33(10): 1089-1096.
[4]	WANG Hong-Yan, ZHANG Hao, JIANG Hong, WANG Guo-Qing, XIONG Chun-Rong. Preparation of Coating Glass with High Visible Transmittance and High UV Cut-off [J]. Journal of Inorganic Materials, 2017, 32(7): 758-764.
[5]	WANG Fo-Gen, CHEN Yun-Lu, REN Sheng-Qiang, ZHANG Jia-Yuan, WU Li-Li, FENG Liang-Huan. Properties of CdS:Al Films Deposited by Magnetron Sputtering [J]. Journal of Inorganic Materials, 2017, 32(4): 413-417.
[6]	LI Miao-Lei, WANG En-Qing, YUE Jian-Ling, HUANG Xiao-Zhong. Microstructure, Mechanical and Tribological Property of TiAlN/VN Nano-multilayer Films [J]. Journal of Inorganic Materials, 2017, 32(12): 1280-1284.
[7]	ZHU Yu-Chan, YUAN Min, ZHANG Huan, WANG Le, QUAN Shan-Shan, CHAI Bo, REN Zhan-Dong. Preparation of Pt/Ti Electrodes Preferred Growth along the [111] Direction and Its Electrocatalytic Activity for Chlorine Evolution [J]. Journal of Inorganic Materials, 2016, 31(5): 510-516.
[8]	WU Zhi-Li, LI Yu-Ge, WU Bi, LEI Ming-Kai. Microstructure Controlling and Properties of TiAlSiN Nanocomposite Coatings Deposited by Modulated Pulsed Power Magnetron Sputtering [J]. Journal of Inorganic Materials, 2015, 30(12): 1254-1260.
[9]	ZHANG Zhi-Wei, DENG Yuan. Large-scale Fabrication of Tellurium Nanowire Arrays by Magnetron Sputtering with Controllable Morphology [J]. Journal of Inorganic Materials, 2015, 30(1): 107-112.
[10]	ZHANG Hui, MA Yong-Jun, WANG Yi-Cheng, WEN Dan-Dan, YE Fei, BAI Fei-Ming. Preparation of 1-3 Dimensional PZT-NFO Nanocomposite Films by Off-axis Magnetron Sputtering [J]. Journal of Inorganic Materials, 2014, 29(4): 371-376.
[11]	CAO Li-Li, WANG Yao, DENG Yuan, LUO Bing-Wei, ZHU Wei, SHI Yong-Ming，LIN Zhen. Influence of Cu on Transport Properties of Thermoelectric Thin Film Fabricated via Magnetron Co-sputtering Method [J]. Journal of Inorganic Materials, 2014, 29(2): 215-219.
[12]	WANG Wei-Jun, HE Jun, ZHANG Ke-Zhi, TAO Jia-Hua, SUN Lin, CHEN Ye, YANG Ping-Xiong, CHU Jun-Hao. Structure and Optical Properties of CuInSe₂ and Cu_0.9In_0.9Zn_0.2Se₂ Thin Films Deposited by One-step Radio-frequency Magnetron Sputtering [J]. Journal of Inorganic Materials, 2014, 29(11): 1223-1227.
[13]	TONG Bei, YANG Xiao-Fei, LIN Geng-Qi, CHEN Shi, OUYANG Jun. Preparation and Converse Magnetoelectric Effect of AlN/FeCoSiB Magnetoelectric Composite Films [J]. Journal of Inorganic Materials, 2013, 28(9): 982-986.
[14]	XU Jun-Hua, XUE Ya-Ping, CAO Jun, YU Li-Hua. Influence of V Content on Microstructure, Mechanical and Friction Properties of TaVN Composite Films [J]. Journal of Inorganic Materials, 2013, 28(7): 769-774.
[15]	CAO Jun, XU Jun-Hua, YU Li-Hua. Mechanical Properties and Tribological Performance of TiN/VCN Multilayers [J]. Journal of Inorganic Materials, 2013, 28(2): 195-200.