Journal of Inorganic Materials ›› 2018, Vol. 33 ›› Issue (3): 284-288.DOI: 10.15541/jim20170179

• Orginal Article • Previous Articles     Next Articles

Influence of Reaction Time on Hydrogen Resistance Film on the Surface of ZrH1.8 in Aluminate System

ZHANG Peng-Fei1, 2, YAN Shu-Fang1, CHEN Wei-Dong1, LI Shi-Jiang1, ZHAO Li1, WANG Hong-Xing2   

  1. 1. College of Materials Science and Engineering, Inner Mongolia University of Technology, Hohhot 010051, China;
    2. Institute of Wide Band Gap Semiconductors, Xi'an Jiaotong University, Xi'an 710049, China;
  • Received:2017-04-17 Revised:2017-06-06 Published:2018-03-20 Online:2018-03-12
  • About author:ZHANG Peng-Fei. E-mail: pfzhang.kk@foxmail.com
  • Supported by:
    National Natural Science Foundation of China (51164023, 51364026);Natural Science Foundation of Inner Mongolia Autonomous Region (2016MS0505);Science Project of Inner Mongolia University of Technology (X201410)

Abstract:

Micro-arc oxidation process was conducted on ZrH1.8 in the electrolyte composed of NaAlO2 to fabricate hydrogen resistance film. The as-prepared film was then characterized by field emission scanning electron microscope (FE-SEM), X-ray diffraction (XRD), and vacuum dehydrogenation experiment. The influences of reaction time on thickness, micro-morphology, structure, and hydrogen resistance properties of the hydrogen resistance film on the surface of ZrH1.8 were investigated. The results show that the thickness of the surface film increases from 78.4 μm to 152.8 μm with the oxidation time changing from 7.5 min to 15 min. The film is composed of M-ZrO2, T-ZrO2 and C-ZrO2, and the oxidation time has no obvious influence on its structure. The film comprises of an exterior loose layer and an interior layer by substrate. When the oxidation time is 10 min, the obtained film is compact and uniform, and has a moderate thickness, showing an excellent hydrogen permeation resistance, of which the Permeation Reduction Factor (PRF) value reaches up to the maximum of 20.

 

Key words: zirconium hydride, micro-arc oxidation technology, reaction time, oxide film

CLC Number: