Journal of Inorganic Materials ›› 2016, Vol. 31 ›› Issue (7): 745-750.DOI: 10.15541/jim20150613

• Orginal Article • Previous Articles     Next Articles

Influence of Double Channel Layers on the Performance of Nitrogen Doped Indium-zinc-oxide Thin Film Transistors

WANG Nai-Qian1, ZHANG Qun1, SHIEH Han-Ping2   

  1. (1. Department of Material Science, Fudan University, National Engineering Lab of TFT-LCD Materials and Technologies, Shanghai 200433, China; 2. Department of Photonics, National Chiao Tung University, Hsinchu 30010, Taiwan, China)
  • Received:2015-12-07 Revised:2016-01-11 Published:2016-07-20 Online:2016-06-22
  • About author:WANG Nai-Qian. E-mail: 13210300033@fudan.edu.cn
  • Supported by:
    National Natural Science Foundation of China (61136004, 61471126)

Abstract:

The nitrogen-doped amorphous indium-zinc-oxide thin film transistors with double channel layers (a-IZO/IZON-TFTs) were fabricated by RF magnetron sputtering of IZO target on the thermal oxidized p-type Si substrate. Influence of the double channel layers on the electrical performance and thermal stability of the devices were investigated. It is found that a-IZO/IZON-TFTs have high field effect mobility of 23.26 cm2/(V•s) and more positively shifted threshold voltage than that of a-IZO-TFTs. This is ascribed to the doped nitrogen which can help reduce oxygen vacancy in the channel layer, suppress carrier concentration and make the devices have a better threshold voltage. Meanwhile, employing a-IZO thin film can avoid the sharp drop of field effect mobility and drain on current caused by nitrogen doping on a-IZON layer, leading to promoting Ion/Ioff ratio effectively. Besides, according to the transfer characteristics measured at temperatures from 298 K to 423 K, devices with a-IZO/IZON double layers have superior performance and thermal stability to TFTs of single channel layer, which can be ascribed to the protective effect of a-IZON thin film on the channel layers. The doped nitrogen can reduce the adsorption/desorption reaction of oxygen molecules on the back channel layer, leading to a significant improvement on thermal stability of the devices.

Key words: double channel layers, nitrogen doped, thermal stability, thin film transistors

CLC Number: