Fabrication and Irradiation of Nanocrystalline Yttrium-stabilized Cubic ZrO2 Film

doi:10.15541/jim20140651

Abstract

Abstract:

Nanocrystalline cubic yttrium-stabilized ZrO₂ films (YSZ) were prepared on silicon substrate via Sol-Gel combined with spin-coating method. The as-grown films were characterized by optical microscope, SEM, XRD and TEM. It was found that preparation parameters have obvious effect on quality of the YSZ film. The quality of YSZ thin films can be greatly improved by adding PVA as dispersing agent, adopting the grading drying process and increasing the spin speed. Smooth films without any cracks can be obtained by optimum growth conditions. XRD result shows that the film is cubic structure with no other phase. The thickness of the YSZ film is about 60 nm, and its average grain-size is 9.4 nm. When the samples are irradiated by Xe ions with low dose at room-temperature, microscopic cracks are detected in the YSZ films. As the ion irradiation dose increases, the irradiation-induced cracks are gradually recovered, which might attribute to the thermal spike effect on the film. In addition, the average grain-size of the YSZ film grows with irradiation dose increasing.

Key words: nanocrystalline ZrO2 film, Sol-Gel, cubic phase, irradiation effect

CLC Number:

TB43

WANG Ka, WAN Kang, ZHANG Jing, CHEN Lin, CHEN Qiong, CHANG Yong-Qin, LONG Yi. Fabrication and Irradiation of Nanocrystalline Yttrium-stabilized Cubic ZrO₂ Film[J]. Journal of Inorganic Materials, 2015, 30(6): 593-598.

Figures/Tables 8

Fig. 1 (a) SEM image of YSZ film without adding PVA, (b) optical microscope image of YSZ film dried in air, SEM image (c) and BSD image (d) of YSZ film without cracks prepared under optimal conditions

Fig. 2 Cross-sectional SEM image of the YSZ film

Fig. 3 (a) XRD and (b) GIXRD patterns of the nanocrystalline YSZ film

Fig. 4 Cross-sectional TEM image (a) and corresponding SAED pattern (b) of YSZ film, STEM-EDS line scan profile from the YSZ film to Si substrate (c) and its enlarged part (d)

Table 1 Element compositions at flat and crack position on the surface of sample

Element line	Flat site /at%	Crack site/at%
O K	17.00	14.22
Si K	79.91	83.25
Zr L	3.10	2.53
Total	100.00	100.00

Fig. 5 SEM images of the YSZ films irradiated with different irradiation doses

Fig. 6 High magnification SEM image of the YSZ films irradiated with 1.0 dpa irradiation dose (a), and corresponding BSD image (b) as well as its EDS line scan profile across the crack (c)

Fig. 7 Plot of average grain-size as a function of irradiation dose

References 19

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Fabrication and Irradiation of Nanocrystalline Yttrium-stabilized Cubic ZrO₂ Film

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