Effect of Hydrogen and Cu Interlayer on the Optical and Electrical Properties of GZO Thin Film

doi:10.3724/SP.J.1077.2014.13396

Journal of Inorganic Materials ›› 2014, Vol. 29 ›› Issue (5): 493-497.DOI: 10.3724/SP.J.1077.2014.13396

• Research Paper • Previous Articles Next Articles

Effect of Hydrogen and Cu Interlayer on the Optical and Electrical Properties of GZO Thin Film

LV Kun, ZHU Bai-Lin, LI Ke, HU Wen-Chao, XIE Ming, WU Jun

(Key Laboratory for Ferrous Metallurgy and Resources Utilization of Ministry of Education, Wuhan University of Science and Technology, Wuhan 430081, China)

Received:2013-08-07 Revised:2013-09-22 Published:2014-05-20 Online:2014-04-24
About author:LV Kun.
Supported by:
The Open Project of High Performance Ceramics and Superfine Structure of National Key Laboratory(SKL201110SIC)

Abstract

Abstract: By method of magnetron sputtering, GZO thin films were deposited in H₂+Ar atmosphere and GZO/Cu/GZO thin films were deposited in Ar atmosphere. Effects of H₂ flux and Cu interlayer thickness on the optical and electrical properties of the films were investigated, respectively. Furthermore, GZO/Cu/GZO films were also deposited in H₂+Ar and the properties of films were investigated as a function of Cu interlayer thickness. The results show that introduction of H₂ into deposition atmosphere can effectively decrease the resistivity and enhance the transmittance of GZO films. The best figure of merit is obtained for the films deposited at H₂ flux of 20 sccm. With increasing Cu interlayer thickness, both the resistivity and transmittance of the GZO/Cu/GZO multilayer film are decreased. After introducing H₂ into deposition atmosphere, the transmittance of GZO/Cu/GZO multilayer film is remarkably decreased although its resistivity is further decreased with increasing Cu interlayer thickness. In addition, it is found that the energy gap (E_g) of the films increases with H2 flux increasing, while it decreases with Cu interlayer thickness increasing.

Key words: GZO thin film, multilayer film, hydrogen doping, transparent conductive film, optical and electrical property

CLC Number:

TN304

LV Kun, ZHU Bai-Lin, LI Ke, HU Wen-Chao, XIE Ming, WU Jun. Effect of Hydrogen and Cu Interlayer on the Optical and Electrical Properties of GZO Thin Film[J]. Journal of Inorganic Materials, 2014, 29(5): 493-497.

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Effect of Hydrogen and Cu Interlayer on the Optical and Electrical Properties of GZO Thin Film

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