Preparation and Characterization of Micro-patterned BiFeO3 Films by Photolithography-self-assembly Method

doi:10.3724/SP.J.1077.2010.10223

Abstract

Abstract: Micro-patterned BiFeO₃thin films were prepared successfully on glass substrates by photolithography-self-assembly method. The characterizations of samples were carried out through XRD, SEM, AFM, XPS and EDS. The results of AFM and contact angle test show that the modification of octadecyltrichlorosilane (OTS) monomolecular layer is achieved by UV-irradiation through a photomask, generating hydrophilic silanol areas and hydrophobic self-assembled monolayer (SAM) regions. XRD and XPS indicate that the films absorbed to the glass substrates are pure rhombohedrally distorted structure BiFeO₃. In addition, SEM and EDS are employed to confirm that no continuous BiFeO₃ particles deposited on SAM regions could be easily peeled off by ultrasonication, while a uniform and clear patterned film with good adherence is site-selectively formed in the hydrophilic silanol regions.

Key words: photolithography-self-assembly, BiFeO3 films, micro-patterns

CLC Number:

O614
TB43

WANG Yan, TAN Guo-Qiang, MIAO Hong-Yan. Preparation and Characterization of Micro-patterned BiFeO₃ Films by Photolithography-self-assembly Method[J]. Journal of Inorganic Materials, 2010, 25(11): 1228-1232.

References

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Preparation and Characterization of Micro-patterned BiFeO₃ Films by Photolithography-self-assembly Method

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