Journal of Inorganic Materials

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Effect of Annealing Temperature on the Microstructure and Scintillation Properties of CsI(Tl) Films

CHENG Feng1,2, ZHONG Yu-Rong2, WANG Bao-Yi2, WANG Tian-Min3, WEI Long2   

  1. 1. School of Physical Science and Technology, Lanzhou University, Lanzhou 730000, China; 2. Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049, China; 3. School of Science, Beijing University of Aeronautics and Astronautics, Beijing 100083; China
  • Received:2007-09-04 Revised:2007-11-02 Published:2008-07-20 Online:2008-07-20

Abstract: CsI(Tl) films were prepared by thermal evaporation and annealed at various temperatures. Structure and scintillation properties of the films were examined using X-ray diffraction, scanning electron microscope, X-ray fluorescence spectrometry, positron annihilation lifetime spectroscope and scintillation pulse height spectrometry. Results show that the CsI films are in micro-columnar structure with a preferential (200) orientation. When the sample is annealed at 150℃, Tl+ ions diffuse to the sample surface. Consequently, the amount and size of the vacancy type of defects increase. However, the light yield increases a little after annealed. The samples annealed at 250℃ have a good crystalline state and scintillation properties. As the annealing temperature increases to 400℃, the light output of the samples decreases seriously due to the dramatic change of their microstructure and the decrease of Ti+.

Key words: CsI films, microstructure, scintillation properties

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