Journal of Inorganic Materials

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Processing and Characterization of Graded B4 C/Cu Facing Plasma Composite

LING Yun-Han; LI Jiang-Tao; GE Chang-Chun   

  1. Laboratory of Special Ceramics & Powder Metallurgy; University of Science & Technology Beijing; Beijing 100083; China
  • Received:2000-11-27 Revised:2001-01-18 Published:2001-11-20 Online:2001-11-20

Abstract: Based on their distinct resistivity and melting point, a new approach for fabricating graded B4C/Cu composite by rapid self-resistance sintering under ultra-high
pressure was proposed in this paper and with which a near dense plasma facing material with 0-100% compositional distributions of B4C was obtained
on conditions of 12kW electric power input, 2-4GPa pressure applied, 40s duration and properly consecutive heat treatment. Well-graded composition and
structure of that composite were demonstrated by SEM analysis. Tests on plasma relevant performances show that the chemical sputtering yield of B4C/Cu graded
composite is 70% lower than that of SMF 800 nuclear graphite, and the surface of the composite is almost no damages after in-situ plasma irradiation in Tokamak apparatus.

Key words: functionally graded material, composite, plasma facing material, boron carbide, copper, sintering

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