Journal of Inorganic Materials

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Distribution and Content of Hydrogen in DLC Films Prepared by Plasma Based Pulsed Bias Deposition

XIA Li-Fang1; SUN Ming-Ren2   

  1. 1. 433 Pillar-Box; Harbin Institute of Technology; Harbin 150001; China; 2. 428 Pillar-Box; China
  • Received:2001-07-16 Revised:2001-09-03 Published:2002-07-20 Online:2002-07-20

Abstract: The distribution and content of hydrogen in DLC films prepared by plasma based pulsed bias deposition were characterized systematically by nuclear reaction
analysis (NRA). It was found that the DLC films with low hydrogen content can be obtained by plasma based bias deposition technique. The range of hydrogen
content in DLC films is about 6at% to 17at%, and the hydrogen distribution is equalization along the depth of films. With decrease in plasma density and
ionizability, the hydrogen contents in DLC films increase, however, the segregation of hydrogen in DLC films is promoted by hydrogen gas introduced into the working
gas. The dehydrogenation is promoted obviously by the energetic ions bombardment on growth surface.

Key words: DLC film, hydrogen distribution, hydrogen content

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