关键词: 射频磁控共溅射法, CuO/SiO₂复合薄膜, 微观结构, 光致发光特性

Abstract: Cu/SiO₂ composite thin films were deposited on n-type Si(111) substrates by radio frequency (RF) magnetron cosputtering method, annealed at high temperature in N₂ atmosphere, then cooling and oxidation in the air to fabricate low-dimensionality CuO nanostructure. The microstructure and photo luminescent properties were studied. The main phase of sample is cubic CuO(200) crystal face and sample forms nanoline structure with Cu, O elements as the main components to form CuO/SiO₂ composite thin film in the sample surface after annealing at 1100℃. The ultraviolet light and purplelight appear in photoluminescence (PL) spectra, which is abscribed to the electron transition from the defect level，resulting from the Cu vacancies to the conductor band of CuO composite thin films.

Key words: radio frequency magnetron cosputtering, cupric oxide/sillica composite thin films, microstructure, photoluminescent properties