纳米多层膜中的非晶晶化与超硬效应

doi:10.3724/SP.J.1077.2006.01292

无机材料学报

纳米多层膜中的非晶晶化与超硬效应

孔明, 岳建岭, 李戈扬

(上海交通大学金属基复合材料国家重点实验室, 上海 200030)

收稿日期:2005-11-30 修回日期:2006-02-24 出版日期:2006-11-20 网络出版日期:2006-11-20

Crystallization of Amorphous and Superhardness Effect in Nano-multilayer Films

KONG Ming, YUE Jian-Ling, LI Ge-Yang

(State Key Lab of Metal Matrix Composites, Shanghai Jiaotong University, Shanghai 200030, China)

Received:2005-11-30 Revised:2006-02-24 Published:2006-11-20 Online:2006-11-20

摘要/Abstract

摘要： 通过对TiN/SiC、TiN/TiB₂和TiN/SiO₂纳米多层膜微结构和力学性能的研究, 展示了通常溅射沉积态为非晶的SiC、TiB2和SiO₂薄膜, 在立方结构的TiN晶体层模板作用下的晶化现象, 以及多层膜由此产生的生长结构和力学性能的变化. 结果表明: SiC在层厚0.6nm时晶化为立方结构后,可以反过来促进TiN/SiC多层膜中TiN层的晶体完整性; TiB₂在层厚2.9nm时晶化为六方结构, 并与TiN形成{111} _TiN//{0001}_TiB2, <100> _TiN//<11-20> _TiB2的共格关系; SiO₂在层厚0.9nm 时晶化为立方结构的赝晶. 多层膜中SiC、TiB₂和SiO₂晶化后都与TiN形成共格外延的生长结构, 并相应产生了硬度升高的超硬效应. 随着SiC、TiB₂和SiO₂层厚的增加, 它们又转变为非晶态, 多层膜的共格外延生长受到破坏, 其硬度亦明显降低.

关键词: 纳米多层膜, 外延生长, 非晶晶化, 超硬效应

Abstract: Template-induced epitaxial crystallization of SiC, TiB₂ and SiO₂ in TiN/SiC, TiN/TiB₂ and TiN/SiO₂ nano-multilayer films and its influence on mechanical properties of the corresponding films were investigated. Results reveal that amorphous SiC, TiB₂ and SiO₂, which are more favorable under sputtering conditions, crystallize at smaller layer thicknesses due to the template effect of c-TiN layers. In particular, SiC crystallizes out in the face-centered cubic structure when its thickness is less than 0.6nm, which improves the crystal quality and structural integrity of the films; While TiB2, with thickness less than 2.9nm, forms hcp structure. The epitaxial orientation relationship between TiN and TiB2 is {111} TiN//{0001} _TiB2, <100> _TiN//<11-20> _TiB2; SiO₂, different from the above two, forms fcc pseudo-crystalline structure under a thickness of 0.9nm. With the crystallization of SiC, TiB₂ and SiO₂, hardness anomalous enhancement, i.e. superhardness effect, appears in those films. This phenomeon of hardness enhancement disappears rapidly when further increase the thickness of SiC, TiB₂and SiO₂ layers, and at the same time, crystallines of SiC, TiB₂ and SiO₂ transform into their amorphous forms, respectively. The formation of these relatively soft amorphous layers, which blocks the coherent growth of the multilayer films, is the main reason of hardness decline at large SiC, TiB₂and SiO₂ layer thicknesses.

Key words: nano-multilayer films, epitaxial growth, crystallization of amorphous, superhardness effect

中图分类号:

O484

孔明,岳建岭,李戈扬. 纳米多层膜中的非晶晶化与超硬效应[J]. 无机材料学报, DOI: 10.3724/SP.J.1077.2006.01292.

KONG Ming,YUE Jian-Ling,LI Ge-Yang. Crystallization of Amorphous and Superhardness Effect in Nano-multilayer Films[J]. Journal of Inorganic Materials, DOI: 10.3724/SP.J.1077.2006.01292.

参考文献

[1] Helmersson U, Todorora S, Barnett S A, et al. J. Appl. Phys., 1987, 62 (2): 481--484.
[2] Chu X, Barnett S A, Wong M S, et al. Surf. Coat. Technol., 1993, 57: 13--18. [3] Setoyama M, Nakayama A, Tanaka M, et al. Surf. Coat. Technol., 1996, 86--87(1--3): 225--230.
[4] Nordin M, Larsson M, Hogmark S. Surf. Coat. Technol., 1998, 106(2--3): 234--241.
[5] Madan M, Kim I W, Cheng S C, et al. Phys. Rev. Lett., 1997, 78(9): 1743--1746.
[6] Yashar P, Chu X, Barnett S A, et al. Appl. Phys. Lett., 1998, 72(8): 987--989. [7] Veno M, Onodera A, Shimomura O, et al. Phys. Rev. B., 1992, 45: 10123--10126.
[8] Ravindra P, Amin S, Max S, et al. J. Mater. Res., 1993, 8: 1922--1927.
[9] Wang Y Y, Wong M S, Chia W J, et al. J. Vac. Sci. Technol. A, 1998, 16(6): 3341--3347.
[10] 胡晓萍, 李戈扬, 顾明元. 材料研究学报, 2003, 17(3): 326--331.
[11] Li G Y, Lao J J, Tian J W, et al. J. Appl. Phys., 2004, 95(1): 92--96.
[12] Kim I W, Li Q, Marks L D, et al. Appl. Phys. Lett., 2001, 78(7): 892--894.
[13] 吴大维, 付德君, 毛先唯, 等. 物理学报, 1999, 48(5): 904--912.
[14] Li D, Chu X, Cheng S C, et al. Appl. Phys. Lett., 1995, 67(2): 203--205.
[15] Li D, Lin X W, Cheng S C, et al. Appl. Phys. Lett., 1996, 68(9): 1211--1213.
[16] Kim C, Qadri S B, Scanlon M R, et al. Thin Solid Films, 1994, 240: 52--55.
[17] 田家万, 韩增虎, 赖倩茜, 等. 机械工程学报, 2003, 39(6): 71--74.
[18] Sproul W D. Science, 1996, 273(16): 889--892.
[19] Yashar P, Barnett S A, Hultman L, et al. J. Mater. Res., 1999, 14(9): 3614--3622.
[20] Sproul W D. Vacuum, 1998, 51(4): 641--646.
[21] 冯端, 师昌绪, 刘治国. 材料科学导论, 第一版, 北京: 化学工业出版社, 2002. 588--589.
[22] Koehler J S. Phys. Rev. B, 1970, 2(2): 547--551.
[23] Kato M, Mori T, Schwartz L H. Acta. Metall., 1980, 28(3): 285--290.
[24] Andson P M, Li C. Nanostructure Mate., 1995, 5(3): 349--362.

纳米多层膜中的非晶晶化与超硬效应

Crystallization of Amorphous and Superhardness Effect in Nano-multilayer Films

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