Si3N4/FePd/Si3N4薄膜的晶体结构和磁性能研究

doi:10.15541/jim20170520

无机材料学报 ›› 2018, Vol. 33 ›› Issue (8): 909-913.DOI: 10.15541/jim20170520

Si₃N₄/FePd/Si₃N₄薄膜的晶体结构和磁性能研究

周鑫¹, 马垒^{1, 2}, 刘涛¹, 郭永斌¹, 王岛¹, 董培林¹

桂林电子科技大学1. 材料科学与工程学院;
2. 广西信息材料重点实验室, 桂林 541004

收稿日期:2017-11-03 修回日期:2017-12-20 出版日期:2018-08-28 网络出版日期:2018-07-17
作者简介:周鑫(1993-), 男, 硕士. E-mail: 1184304554@qq.com.
基金资助:
广西自然科学基金(2016GXNSFAA380030, 2016GXNSFGA380001);国家自然科学基金(51461012);桂林电子科技大学研究生教育创新计划资助项目(2018YJCX84);优秀学位论文培养项目(16YJPYSS32);Guangxi Natural Science Foundation (2016GXNSFAA380030, 2016GXNSFGA380001);Innovation Project of GUET Graduate Education (2018YJCX84);GUET Excellent Graduate Thesis Program (16YJPYSS32)

Crystal Structure and Magnetic Property of Si₃N₄/FePd/Si₃N₄ Thin Films

ZHOU Xin¹, MA Lei^{1, 2}, LIU Tao¹, GUO Yong-Bin¹, WANG Dao¹, DONG Pei-Lin¹

1. School of Materials Science and Engineering, Guilin University of Electronic Technology, Guilin 541004, China;
2. Guangxi Key Laboratory of Information Materials, Guilin University of Electronic Technology, Guilin 541004, China

Received:2017-11-03 Revised:2017-12-20 Published:2018-08-28 Online:2018-07-17
About author:ZHOU Xin. E-mail: 1184304554@qq.com.
Supported by:
National Natural Science Foundation of China (51461012)

摘要/Abstract

摘要：

采用磁控溅射的方法制备了Si₃N₄/FePd/Si₃N₄三层膜, 研究了非磁性材料Si₃N₄作为插入层对磁记录FePd薄膜结构与磁性能的影响。结果表明, 热处理后Si₃N₄分布在FePd纳米颗粒之间, 抑制了FePd晶粒的生长, 与纯FePd薄膜相比, Si₃N₄/FePd/Si₃N₄薄膜的颗粒明显得到细化; 通过添加Si₃N₄层, FePd薄膜的晶体学参数c/a从0.960减小到0.946, 表明Si₃N₄可以有效促进FePd薄膜的有序化进程, 同时提升了矫顽力和剩磁比, 分别提高到249 kA/m、0.86; 随着600℃退火时间的进一步延长, 添加Si₃N₄的薄膜磁性没有迅速下降, 在较宽的热处理时间范围内磁性能保持在比较高的水平, 提高了抗热影响的能力。Si₃N₄作为插入层对FePd薄膜的磁性能具有较大的提升作用, 这对磁记录薄膜的发展具有重要意义。

关键词: Si₃N₄/FePd/Si₃N₄, FePd薄膜, 晶体结构, 磁性能

Abstract:

Si₃N₄/FePd/Si₃N₄ trilayer films were prepared by magnetron sputtering. The effect of Si₃N₄ insert as a non-magnetic material on structure and magnetic properties of FePd films was investigated. The results show that Si₃N₄ particles distribute between the FePd nanoparticles after heat treatment, which inhibit the growth of FePd grains. Compared with pure FePd films, the grains of Si₃N₄/FePd /Si₃N₄ thin films are obviously refined. By adding Si₃N₄ insert, the crystallographic parameters c/a of FePd films decrease from 0.960 to 0.946, indicating that Si₃N₄ content could effectively promote the ordering process of FePd films and improve the coercivity and remanence ratio. The coercivity and remanence ratio are increased to 249 kA/m and 0.86, respectively. With the further increase of the annealing time at 600℃, the magnetic property of the Si₃N₄-doped FePd thin films does not decrease rapidly, and its relatively high magnetic properties maintain over a wide range of annealing time, which indicate that the thermal resistance of FePd thin films are obviously improved. Si₃N₄ insert plays a great role in promoting the magnetic properties of FePd thin films, which is significant for the development of magnetic recording film materials.

Key words: Si₃N₄/FePd/Si₃N₄, FePd film, crystal structure, magnetic properties

中图分类号:

TM27

周鑫, 马垒, 刘涛, 郭永斌, 王岛, 董培林. Si₃N₄/FePd/Si₃N₄薄膜的晶体结构和磁性能研究[J]. 无机材料学报, 2018, 33(8): 909-913.

ZHOU Xin, MA Lei, LIU Tao, GUO Yong-Bin, WANG Dao, DONG Pei-Lin. Crystal Structure and Magnetic Property of Si₃N₄/FePd/Si₃N₄ Thin Films[J]. Journal of Inorganic Materials, 2018, 33(8): 909-913.

图/表 5

图1 FePd层的EDS分析结果

Fig. 1 EDS analysis results of FePd layer

图2 FePd(a)薄膜和Si3N4/FePd/Si3N4(b)薄膜经600℃热处理不同时间后的XRD图谱

Fig. 2 XRD patterns of FePd (a) films and Si3N4/FePd/Si3N4 (b) films annealed at 600℃ for different time

图3 600℃热处理的FePd和Si3N4/FePd/Si3N4薄膜的晶粒尺寸随热处理时间的变化

Fig. 3 Grain sizes of FePd and Si3N4/FePd/Si3N4 films versus annealing time at 600℃

图4 FePd (a)、(c)和Si3N4/FePd/Si3N4 (b)、(d)薄膜的AFM和SEM形貌

Fig. 4 AFM and SEM images of FePd (a, c) and Si3N4/FePd/ Si3N4 (b, d) films (a, b) As-deposited; (c, d) Annealed at 600℃ for 3 h

图5 FePd (a)和Si3N4/FePd/Si3N4 (b)薄膜经600℃热处理不同时间后的磁滞曲线以及FePd (c)和Si3N4/FePd/Si3N4 (d)薄膜的Hc和Mr/Ms与热处理时间的关系曲线

Fig. 5 Hysteresis loops of FePd (a) and Si3N4/FePd/Si3N4 (b) films annealed at 600℃ for different time, and the relationship between Hc, Mr/Ms and heat treatment time of FePd (c) and Si3N4/FePd/Si3N4 (d)

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Si₃N₄/FePd/Si₃N₄薄膜的晶体结构和磁性能研究

Crystal Structure and Magnetic Property of Si₃N₄/FePd/Si₃N₄ Thin Films

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