无机材料学报 ›› 2016, Vol. 31 ›› Issue (9): 981-986.DOI: 10.15541/jim20160080

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铝掺杂对氧化锌压敏陶瓷电性能的影响

蔺家骏, 李盛涛, 何锦强, 刘文凤   

  1. (西安交通大学 电力设备电气绝缘国家重点实验室, 西安710049)
  • 收稿日期:2016-02-01 修回日期:2016-03-28 出版日期:2016-09-20 网络出版日期:2016-08-29
  • 作者简介:蔺家骏(1990–), 男, 博士研究生. E-mail: 425964714@qq.com
  • 基金资助:
    国家重点基础研究发展计划(973计划)(2015CB251003)

Effect of Al Addition on Electrical Properties of ZnO-based Varistor Ceramics

LIN Jia-Jun, LI Sheng-Tao, HE Jin-Qiang, LIU Wen-Feng   

  1. (State Key Laboratory of Electrical Insulation and Power Equipment, Xi’an Jiaotong University, Xi’an 710049, China)
  • Received:2016-02-01 Revised:2016-03-28 Published:2016-09-20 Online:2016-08-29
  • About author:LIN Jia-Jun. E-mail: 425964714@qq.com

摘要:

研究了微量铝(Al)掺杂对氧化锌(ZnO)压敏陶瓷显微结构、电性能和本征点缺陷浓度等方面的影响及其作用机理。研究结果表明, 介电损耗峰值能够在一定程度上反映ZnO压敏陶瓷本征点缺陷浓度, 微量Al掺杂能够引起ZnO压敏陶瓷本征点缺陷浓度的显著降低。氧空位缺陷对应的损耗峰峰值从88.82下降到1.74, 锌填隙缺陷对应的损耗峰峰值从133.38下降到8.14。随着Al掺杂量的增加, ZnO压敏陶瓷平均晶粒尺寸从9.15 μm逐渐下降到6.24 μm, 而压敏电压从235 V/mm逐渐提高到292 V/mm。可见Al掺杂抑制了ZnO压敏陶瓷中本征点缺陷的形成, 而本征缺陷浓度的降低导致材料显微结构和电性能发生明显变化。本文阐述了Al掺杂对ZnO压敏陶瓷本征缺陷的影响机理, 建立了ZnO压敏陶瓷显微形貌、电性能、介电性能和本征点缺陷之间的联系。

关键词: ZnO压敏陶瓷, Al掺杂, 本征点缺陷

Abstract:

The influences of trace ionic Al addition on the microstructure, electrical properties and intrinsic defects concentration of ZnO-based varistor ceramics were investigated. The results show that the peak value of imaginary permittivity can be used to represent intrinsic defect concentration. Trace ionic Al addition greatly reduces the intrinsic defect concentrations, i.e. the peak value of imaginary permittivity, representing the oxygen vacancy defect decreases from 88.8 to 1.7, and the corresponding zinc interstitial defect decreasing from 133.4 to 8.1. With the increase of ionic Al addition, the varistor voltage increases from 235 V/mm to 292 V/mm and the average grain size decreases from 9.15 μm to 6.24 μm. The results indicate that Al addition effectively restrains the formation of intrinsic defects in ZnO-based varistor ceramics, leading to the change of microstructure and electrical properties. Furthermore, the inhibition mechanism of Al addition to the intrinsic defects in ZnO-based varistor ceramics is discussed, and the relationships between microstructure, electrical properties, dielectric properties and intrinsic defects are established.

Key words: ZnO-based varistor ceramic, Al dopant, intrinsic defect

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