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无机材料学报

无机材料学报

• 研究论文 • 上一篇    下一篇

稀土化合物浆料对CVD金刚石厚膜的刻蚀

王佳宇1; 金爱子1; 白亦真1; 纪红2; 金曾孙1   

  1. 1. 吉林大学超硬材料国家重点实验室, 长春 130023; 2. 吉林大学物理系, 长春 130023
  • 收稿日期:2001-01-02 修回日期:2001-03-22 出版日期:2002-01-20 网络出版日期:2002-01-20

Etching of CVD Diamond Thick Films by Rare-earth Compound Ink

WANG Jia-Yu1; JIN Ai-Zi1; BAI Yi-Zhen1; JI Hong2; JIN Ceng-Sun1   

  1. 1. States Key Lab of Superhard Materials; Jilin University; Changchun 130023; China; 2. Department of Physics; Changchun 130023; China
  • Received:2001-01-02 Revised:2001-03-22 Published:2002-01-20 Online:2002-01-20

PDF (PC)

887

被引次数

9

摘要： ＣＶＤ金刚石厚膜具有极高的硬度，使得对其进行表面抛光极为困难．传统的机械抛光方法既不经济又耗费时间，而一些新的抛光技术又由于实验条件限制而难以推广．针对以上情况，我们寻求到一种新的化学刻蚀方法，即利用稀土化合物浆料对金刚石厚膜生长表面进行刻蚀，破坏表面的晶粒使之成为晶骸，降低表面的耐磨性，以提高表面粗糙的金刚石厚膜的抛光效率．

关键词: CVD金刚石厚膜, 刻蚀, 稀土化合物浆料

Abstract: CVD diamond with high electrical, optical and thermal quality has been used in many applications. However,
its inert chemical nature and high temperature stability make it difficult to be processed. A highly available etching technique compatible with
existing diamond processing is desirable. In this paper, CVD diamond thick films were etched with rare-earth compound ink prepared by the authors. The etching
process is taken in the atmosphere at a temperature below the oxidation temperature of diamond. The technique uses inexpensive and safe rare-earth compound ink and the experimental results show that the processing is simple
and efficient for polishing the CVD diamond thick films rapidly. The results were studied by SEM.

Key words: CVD diamond thick film, etching, rare-earth compound ink

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