Surface Behaviors of U2N3+xOy Films in CO Atmosphere

doi:10.15541/jim20130641

Abstract

Abstract:

U₂N₃₊_xO_y films were deposited on Si substrate by magnetic sputtering deposition method. The behaviors of U₂N₃₊_xO_y after exposure to CO atmosphere was analyzed by X-ray photoelectron spectroscopy (XPS) to explore its CO corrosion mechanism. Under ultra-high vacuum (UHV) condition, it is found that CO atmosphere is oxidative on the surface of U₂N₃₊_xO_y film. The dissociated carbon in forms of amorphous is segregated on the outmost surface rather than diffuses inside, and the diffusion of the dissociated oxygen resulted in oxidation of U₂N₃₊_xO_y, leading to the formation of uranium oxy-nitrides in higher valence state on the surface and an N-rich layer as an intermediacy in the subsurface. The diffusion of oxygen in the film is suppressed on the very surface by the product of uranium oxides or uranium oxy-nitrides in higher valence state due to the potential barrier. The distance of the N-rich layer to the outmost surface dominates the intensity variation of satellites at 386.7 eV and 397.5 eV, which is enlarged with the oxidation process. All abore chemical changes play a very important role for understanding the corrosion mechanism of U₂N₃₊_xO_y films.

Key words: CO, U2N3+xOy, surface corrosion, oxidation

CLC Number:

TQ174

LUO Li-Zhu, LU Lei, LIU Ke-Zhao, ZHAO Dong-Hai. Surface Behaviors of U₂N₃₊_xO_y Films in CO Atmosphere[J]. Journal of Inorganic Materials, 2014, 29(8): 875-879.

Figures/Tables 7

Fig. 1 Spectra of U4f and N1s as function of sputtering time

Fig. 2 Spectra of O1s as function of sputtering time

Fig. 3 Spectra of U4f and N1s as function of CO exposure

Fig. 4 Spectra of O1s as function of CO exposure

Fig. 5 Spectra of C1s as function of CO exposure

Fig. 6 Spectra of C1s as function of sputtering time after reaction with CO

Fig. 7 Variation of FWHM of U4f7/2 peaks as function of CO exposure

References 15

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Surface Behaviors of U₂N₃₊_xO_y Films in CO Atmosphere

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